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Inventor

Isao Kawasumi

Inventor
Singapore, SG

Overview

2→
Patents
1998–2021
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G11BInformation storage based on relative movement between record carrier and transducer20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
Y10TTechnical subjects covered by former us classification20%
PatentTitleYear
11,061,316Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device20215,766,727'Magnetic recording medium and method for manufacturing the same'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2021Patents assigned to HOYA CORP (2)· patent assignee history
1998Based in Nirasaki, JP· patent location history
2021Patents assigned to HOYA ELECTRONICS SINGAPORE PTE LTD (1)· patent assignee history
2021Based in Singapore, SG· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HOYA CORP21998–2021
HOYA ELECTRONICS SINGAPORE PTE LTD12021
Locations
LocationPatentsSpan
Singapore, SG12021
Nirasaki, JP11998