Inventor
Barak Bringoltz
Inventor
Givaat Shmuel, IL
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions24%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
G01NInvestigating or analysing materials by determining their chemical or physical properties22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G02BOptical elements, systems or apparatus8%
H01LSemiconductor devices5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G01RMeasuring electric variables2%
G06FElectric digital data processing2%
G06NComputing arrangements based on specific computational models2%
PatentTitleYear
11,093,840Metrology and process control for semiconductor manufacturing202110,831,108Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology202010,591,406Symmetric target design in scatterometry overlay metrology202010,533,940Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology202010,415,963Estimating and eliminating inter-cell process variation inaccuracy201910,261,014Near field metrology201910,234,280Reflection symmetric scatterometry overlay targets and methods201910,203,200Analyzing root causes of process variation in scatterometry metrology201910,126,238Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology20189,958,385Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology20189,909,982'Pupil plane calibration for scatterometry overlay measurement'20189,903,711'Feed forward of metrology data in a metrology system'20189,874,527Removing process-variation-related inaccuracies from scatterometry measurements20189,869,543'Reducing algorithmic inaccuracy in scatterometry overlay metrology'20189,851,300Decreasing inaccuracy due to non-periodic effects on scatterometric signals20179,784,987'Apodization for pupil imaging scatterometry'20179,739,702'Symmetric target design in scatterometry overlay metrology'20179,726,984'Aperture alignment in scatterometry metrology systems'20179,581,430'Phase characterization of targets'20179,091,650'Apodization for pupil imaging scatterometry'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2020Patents assigned to KLA TENCOR CORP (18)· patent assignee history
2015–2020Based in Givaat Shmuel, IL· patent location history
2017–2020Based in Rishon Lezion, IL· patent location history
2018Patents assigned to KLA—TENCOR CORP (1)· patent assignee history
2020Patents assigned to KLA CORP (1)· patent assignee history
2021Patents assigned to NOVA MEASURING INSTR LTD (1)· patent assignee history
2021Based in Rehovot, IL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 18 | 2015–2020 |
| KLA CORP | 1 | 2020 |
| KLA—TENCOR CORP | 1 | 2018 |
| NOVA MEASURING INSTR LTD | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Givaat Shmuel, IL | 14 | 2015–2020 |
| Rishon Lezion, IL | 5 | 2017–2020 |
| Rehovot, IL | 1 | 2021 |