Inventor

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Inventor
Kasterlee, BE

Overview

10→
Patents
2020–2021
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices77%
B82YSpecific uses or applications of nanostructures8%
G21KHandling of particles or ionising radiation not otherwise provided for8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2020–2021Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2020–2021Patents assigned to ASML HOLDING NV (2)· patent assignee history
2020–2021Based in Kasterlee, BE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102020–2021
ASML HOLDING NV22020–2021
Locations
LocationPatentsSpan
Kasterlee, BE92020–2021