Inventor
Jason Michael Arcand
Inventor
Escondido, CA, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Gprimary
H05GX-ray technique38%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
G02BOptical elements, systems or apparatus15%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution15%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
PatentTitleYear
10,064,261Extreme ultraviolet light source201810,048,199Metrology system for an extreme ultraviolet light source20189,360,600'System and method for correcting the focus of a laser beam'20169,357,625'Extreme ultraviolet light source'20168,681,427'System and method for separating a main pulse and a pre-pulse beam from a laser source'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014Patents assigned to ARCAND JASON MICHAEL (1)· patent assignee history
2014Patents assigned to BERGSTEDT ROBERT A (1)· patent assignee history
2014Patents assigned to CYMER INC (1)· patent assignee history
2014–2016Based in San Diego, CA, US· patent location history
2016–2018Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2016Patents assigned to Cymer LLC (1)· patent assignee history
2016–2018Based in Escondido, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 4 | 2016–2018 |
| ARCAND JASON MICHAELself | 1 | 2014 |
| BERGSTEDT ROBERT A | 1 | 2014 |
| CYMER INC | 1 | 2014 |
| Cymer LLC | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Escondido, California, US | 3 | 2016–2018 |
| San Diego, California, US | 2 | 2014–2016 |