Inventor

Siyuan Ma

Inventor
Bothell, WA, US

Overview

19→
Patents
2014–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G06Fprimary
G06FElectric digital data processing14%
H05KPrinted circuits13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
H01LSemiconductor devices5%
H04LTransmission of digital information, e.g. telegraphic communication4%
A41DOuterwear3%
A61BDiagnosis3%
B41MPrinting, duplicating, marking, or copying processes3%
C23CCoating metallic material3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2016Patents assigned to CLEVERSAFE INC (3)· patent assignee history
2014Patents assigned to MA SIYUAN (1)· patent assignee history
2014–2016Based in Chicago, IL, US· patent location history
2016Patents assigned to IBM (1)· patent assignee history
2017–2021Patents assigned to MICROSOFT TECHNOLOGY LICENSING LLC (14)· patent assignee history
2017–2020Based in Bothell, WA, US· patent location history
2018–2021Based in Redmond, WA, US· patent location history
2019–2020Patents assigned to UNIV NEW YORK STATE RES FOUND (2)· patent assignee history
2019–2020Based in Vestal, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MICROSOFT TECHNOLOGY LICENSING LLC142017–2021
CLEVERSAFE INC32014–2016
UNIV NEW YORK STATE RES FOUND22019–2020
IBM12016
MA SIYUANself12014
Locations
LocationPatentsSpan
Bothell, Washington, US92017–2020
Redmond, Washington, US52018–2021
Chicago, Illinois, US32014–2016
Vestal, New York, US22019–2020