Inventor
WEI-HAN FAN
Inventor
TW
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices31%
B82YSpecific uses or applications of nanostructures29%
H01LSemiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
12,520,555Inner spacer for a multi-gate device and related methods202612,457,770Source and drain engineering process for multigate devices202512,402,364Semiconductor device structure and method for forming the same202512,382,703Spacer features for nanosheet-based devices202512,363,988Inner spacer features for multi-gate transistors202512,302,615Epitaxial structures exposed in airgaps for semiconductor devices202512,191,369Source and drain engineering process for multigate devices202512,142,647Self-aligning backside contact process and devices thereof202412,051,732Semiconductor structure and method for forming the same202411,955,547Semiconductor device including an epitaxy region202411,923,409Epitaxial structures exposed in airgaps for semiconductor devices2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (11)· patent assignee history
2024–2026Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 11 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 11 | 2024–2026 |