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Inventor

YANGCHUN LUO

Inventor
CN

Overview

5→
Patents
2023–2026
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C02Fprimary
C02FTreatment of water, waste water, sewage, or sludge17%
E04HBuildings or like structures for particular purposes17%
A61KPreparations for medical, dental or toiletry purposes8%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations8%
C07DHeterocyclic compounds8%
G06FElectric digital data processing8%
G06NComputing arrangements based on specific computational models8%
LOC238%
Y02ATechnologies for adaptation to climate change8%
Y02PClimate change mitigation technologies in the production or processing of goods8%
PatentTitleYear
D1109847Flow guide202612,516,536Automatic pool cleaning apparatus202612,486,229Indole derivative and application thereof202512,428,866Automatic pool cleaning apparatus202511,704,370Framework for managing features across environments2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to MICROSOFT TECHNOLOGY LICENSING LLC (1)· patent assignee history
2023Based in US· patent location history
2025–2026Patents assigned to AIPER GLOBAL PTE LTD (2)· patent assignee history
2025Patents assigned to SHANGHAI MEDICILON INC (1)· patent assignee history
2025–2026Based in CN· patent location history
2026Patents assigned to SHENZHEN AIPER INTELLIGENT CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
AIPER GLOBAL PTE LTD22025–2026
MICROSOFT TECHNOLOGY LICENSING LLC12023
SHANGHAI MEDICILON INC12025
SHENZHEN AIPER INTELLIGENT CO LTD12026
Locations
LocationPatentsSpan
CN42025–2026
US12023