Inventor
Michael Chiu Kwan
Inventor
Sunnyvale, CA, US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
C23CCoating metallic material16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
G01BMeasuring length, thickness or similar linear dimensions8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01JElectric discharge tubes or discharge lamps5%
A47CChairs3%
B05DProcesses for applying fluent materials to surfaces, in general3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
PatentTitleYear
11,029,148Feed-forward of multi-layer and multi-process information using XPS and XRF technologies202110,648,802Feed-forward of multi-layer and multi-process information using XPS and XRF technologies202010,082,390Feed-forward of multi-layer and multi-process information using XPS and XRF technologies20187,638,440'Method of depositing an amorphous carbon film for etch hardmask application'20097,407,893'Liquid precursors for the CVD deposition of amorphous carbon films'20087,253,123'Method for producing gate stack sidewall spacers'20077,064,077'Method for high aspect ratio HDP CVD gapfill'20067,052,552'Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD'20066,812,153'Method for high aspect ratio HDP CVD gapfill'20046,715,496'Method and apparatus for cleaning a semiconductor wafer processing system'20046,596,123'Method and apparatus for cleaning a semiconductor wafer processing system'20036,335,288'Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD'20026,045,877'Pyrolytic chemical vapor deposition of silicone films'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000Patents assigned to MASSACHUSETTS INST TECHNOLOGY (1)· patent assignee history
2000Based in Mountain View, CA, US· patent location history
2002–2009Patents assigned to APPLIED MATERIALS INC (9)· patent assignee history
2002–2006Based in Redwood City, CA, US· patent location history
2007–2021Based in Sunnyvale, CA, US· patent location history
2018–2021Patents assigned to NOVA MEASURING INSTR INC (3)· patent assignee history
2018Patents assigned to REVERA INCORPORATED (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 9 | 2002–2009 |
| NOVA MEASURING INSTR INC | 3 | 2018–2021 |
| MASSACHUSETTS INST TECHNOLOGY | 1 | 2000 |
| REVERA INCORPORATED | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 6 | 2007–2021 |
| Redwood City, California, US | 6 | 2002–2006 |
| Mountain View, California, US | 1 | 2000 |