Inventor
Masami Hayashida
Inventor
Yokohama, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
G21KHandling of particles or ionising radiation not otherwise provided for25%
B82YSpecific uses or applications of nanostructures20%
B08BCleaning in general5%
G02BOptical elements, systems or apparatus5%
PatentTitleYear
5,848,119'Illumination system and exposure apparatus having the same'19985,641,593'Lithographic mask and exposure apparatus using the same'19975,549,994'Exposure apparatus and reflection type mask to be used in the same'19965,461,657'X-ray mirror, and x-ray exposure apparatus and device manufacturing method employing the same'19955,444,753'X-ray lithography mask, light exposure apparatus and process therefore'19955,390,228'Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices'19955,335,259'X-ray exposure apparatus'19945,204,887'X-ray microscope'19935,145,649'Apparatus for cleaning an optical element for use with a radiation beam'19925,052,033'Reflection type mask'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–1998Patents assigned to CANON KK (10)· patent assignee history
1991–1995Based in Atsugi, JP· patent location history
1994–1998Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 10 | 1991–1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 6 | 1994–1998 |
| Atsugi, JP | 4 | 1991–1995 |