Inventor

Kenji Iwade

Inventor

Hiratsuka, JP

Overview

2008–2018

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%

B24BMachines, devices, or processes for grinding or polishing32%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%

H01LSemiconductor devices9%

C09KMaterials for miscellaneous applications, not provided for elsewhere5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2008–2017Patents assigned to TOSHIBA KK (7)· patent assignee history

2008–2014Patents assigned to EBARA CORP (6)· patent assignee history

2008–2014Based in Hiratsuka, JP· patent location history

2012–2014Patents assigned to IWADE KENJI (4)· patent assignee history

2012–2014Patents assigned to TOGAWA TETSUJI (3)· patent assignee history

2013–2014Patents assigned to ITO KENYA (2)· patent assignee history

2014Based in Tokyo, JP· patent location history

2017–2018Based in Mie, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations