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Inventor

Cornelis J. van der Laan

Inventor
Maasluis, NL

Overview

3→
Patents
2000–2003
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling25%
B24BMachines, devices, or processes for grinding or polishing25%
PatentTitleYear
6,542,219'Optical correction plate, and its application in a lithographic projection apparatus'20036,373,552'Optical correction plate, and its application in a lithographic projection apparatus'20026,159,078'Method and device for shaping a rotationally-symmetrical surface'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to TNO (1)· patent assignee history
2000Based in Maassluis, NL· patent location history
2002Patents assigned to ASM LITHOGRAPHY BV (1)· patent assignee history
2002–2003Based in Maasluis, NL· patent location history
2003Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASM LITHOGRAPHY BV12002
ASML NETHERLANDS BV12003
TNO12000
Locations
LocationPatentsSpan
Maasluis, NL22002–2003
Maassluis, NL12000