Inventor
Roie VOLKOVICH
Inventor
IL
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G01BMeasuring length, thickness or similar linear dimensions16%
H01LSemiconductor devices14%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
G05BControl or regulating systems in general5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
G06NComputing arrangements based on specific computational models3%
G01MTesting static or dynamic balance of machines or structures1%
G01RMeasuring electric variables1%
PatentTitleYear
12,393,113Inter-step feedforward process control in the manufacture of semiconductor devices202512,347,706Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein202512,222,199Systems and methods for measurement of misregistration and amelioration thereof202511,971,664Reducing device overlay errors202411,862,521Multiple-tool parameter set calibration and misregistration measurement system and method202411,761,969System and method for analyzing a sample with a dynamic recipe based on iterative experimentation and feedback202311,644,419Measurement of properties of patterned photoresist202311,640,117Selection of regions of interest for measurement of misregistration and amelioration thereof202311,635,682Systems and methods for feedforward process control in the manufacture of semiconductor devices202311,551,980Dynamic amelioration of misregistration measurement202311,532,566Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices202211,467,503Field-to-field corrections using overlay targets202211,454,894Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof202211,360,398System and method for tilt calculation based on overlay metrology measurements202211,353,321Metrology system and method for measuring diagonal diffraction-based overlay targets202211,353,493Data-driven misregistration parameter configuration and measurement system and method202211,353,799System and method for error reduction for metrology measurements202211,355,375Device-like overlay metrology targets displaying Moire effects202211,302,544Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein202211,226,566Method of measuring misregistration of semiconductor devices2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to KLA CORP (14)· patent assignee history
2022–2025Patents assigned to KLA TENCOR CORP (6)· patent assignee history
2022–2025Based in IL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA CORP | 14 | 2022–2025 |
| KLA TENCOR CORP | 6 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| IL | 20 | 2022–2025 |