Inventor
Tadayoshi Kokubo
Inventor
Shizuoka, JP
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
G03CPhotosensitive materials for photographic purposes15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%
C07CAcyclic or carbocyclic compounds8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C07DHeterocyclic compounds2%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
H01BCables2%
Y10TTechnical subjects covered by former us classification2%
PatentTitleYear
5,707,777'Light-sensitive composition'19985,576,139'Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst'19965,576,143'Light-sensitive composition'19965,565,300'Positive photoresist composition'19965,494,773'Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group'19965,429,905'Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound'19955,389,492'Resist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compound'19955,380,618'Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent'19955,360,692'Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent'19945,340,686'Positive-type photoresist composition'19945,340,697'Negative type photoresist composition'19945,340,688'Positive type photoresist composition'19945,324,618'Positive type quinonediazide photoresist composition containing select tetraphenolic additive'19945,324,619'Positive quinone diazide photoresist composition containing select polyhydroxy additive'19945,318,875'Positive quinonediazide photoresist composition containing select hydroxyphenol additive'19945,290,658'Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient'19945,248,582'Positive-type photoresist composition'19935,173,389'Positive-working photoresist composition'19925,153,096'Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide'19925,130,224'Positive-working photoresist composition'19925,110,709'Light-sensitive positive working composition containing a pisolfone compound'19925,089,373'Positive photoresist composition utilizing O-quinonediazide and novolak resin'19925,030,550'Developer for positive type photoresists'19914,894,311'Positive-working photoresist composition'19904,871,645'Positive-working photoresist composition'19894,863,828'Positive-working o-quinone diazide photoresist composition'19894,842,986'Positively working resist material'19894,657,846'Silver halide photographic printing paper'19874,639,416'Internal latent image-type silver halide emulsion'19874,592,991'Silver halide photographic printing paper'19864,551,424'Silver halide photographic light-sensitive material'19854,546,075'Heat-developable photographic material'19854,452,885'Heat-developable photographic material'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–1998Patents assigned to FUJI PHOTO FILM CO LTD (33)· patent assignee history
1984–1989Based in Kanagawa, JP· patent location history
1989–1998Based in Shizuoka, JP· patent location history
1995Patents assigned to NIPPON TELEGRAPH & TELEPHONE (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI PHOTO FILM CO LTD | 33 | 1984–1998 |
| NIPPON TELEGRAPH & TELEPHONE | 1 | 1995 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 26 | 1989–1998 |
| Kanagawa, JP | 7 | 1984–1989 |