Inventor
Keiichi Nashimoto
Inventor
Minami-ashigara, JP
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Fprimary
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein31%
G02BOptical elements, systems or apparatus17%
H10DInorganic electric semiconductor devices10%
Y10TTechnical subjects covered by former us classification7%
C23CCoating metallic material5%
C30BSingle-crystal growth5%
H10NElectric solid-state devices not otherwise provided for5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
C03CChemical composition of glasses, glazes or vitreous enamels3%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
PatentTitleYear
7,526,176'Optical amplifier and fabrication method thereof'20097,302,140'Optical switch and matrix optical switch'20076,862,393'Optical waveguide element, manufacturing method for optical waveguide element, optical deflecting element, and optical switching element'20056,816,660'Optical waveguide element and method of fabrication thereof'20046,529,667'Optical waveguide element, manufacturing method for optical waveguide element, optical deflecting element, and optical switching element'20036,470,125'Optical device, driving method of optical device and manufacture of optical device'20026,385,355'Optical deflection element'20026,307,996'Optical waveguide device and manufacturing method thereof'20016,078,717'Opical waveguide device'20006,025,864'Optical scanning device and image forming apparatus'20006,001,416'Oxide thin film and process for forming the same'19995,852,703'Ferroelectric thin film element and production method thereof'19985,834,803'Oriented ferroelectric thin film element and process for preparing the same'19985,802,223'Optical deflecting device'19985,790,167'Optical scanning device, optical scanning method, and image forming apparatus using the same'19985,776,621'Oriented ferroelectric thin film element'19985,759,265'Oriented ferroelectric thin-film element and manufacturing method therefor'19985,677,970'Optical scanning device and image forming apparatus using the same'19975,656,382'Oriented conductive film and process for preparing the same'19975,650,362'Oriented conductive film and process for preparing the same'19975,637,346'Process for preparing a thin ferroelectric or para-dielectric oxide film'19975,576,879'Composite optical modulator'19965,567,979'Oriented ferroelectric thin-film element and manufacturing method therefor'19965,525,434'Oriented multi-layer thin film of ferrodielectric substance and method of producing the same'19965,514,484'Oriented ferroelectric thin film'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2003Patents assigned to FUJI XEROX CO LTD (21)· patent assignee history
1996–2000Based in Minami-ashigara, JP· patent location history
1996–1998Based in Kanagawa, JP· patent location history
2000–2003Based in Nakai-machi, JP· patent location history
2004–2005Patents assigned to NOZOMI PHOTONICS CO LTD (2)· patent assignee history
2004–2009Based in Ayase, JP· patent location history
2007Patents assigned to UNIV KEIO (1)· patent assignee history
2009Patents assigned to EPIPHOTONICS CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI XEROX CO LTD | 21 | 1996–2003 |
| NOZOMI PHOTONICS CO LTD | 2 | 2004–2005 |
| EPIPHOTONICS CORP | 1 | 2009 |
| UNIV KEIO | 1 | 2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Minami-ashigara, JP | 11 | 1996–2000 |
| Nakai-machi, JP | 5 | 2000–2003 |
| Kanagawa, JP | 5 | 1996–1998 |
| Ayase, JP | 4 | 2004–2009 |