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Inventor

Sicco Oosterhoff

Inventor
Nuenen, NL

Overview

2→
Patents
2020
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
B82YSpecific uses or applications of nanostructures20%
G21KHandling of particles or ionising radiation not otherwise provided for20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,852,633Method for manufacturing a membrane assembly202010,712,656Method for manufacturing a membrane assembly2020

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2020Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2020Based in Nuenen, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22020
Locations
LocationPatentsSpan
Nuenen, NL22020