Inventor

Norbertus Benedictus Koster

Inventor
Delft, NL

Overview

14→
Patents
2003–2018
Patent span
Physics
Primary field (CPC G)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
H01JElectric discharge tubes or discharge lamps17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
B82YSpecific uses or applications of nanostructures7%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
A61LMethods or apparatus for sterilising materials or objects in general3%
C23CCoating metallic material3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
H01LSemiconductor devices3%
H05HPlasma technique3%
PatentTitleYear
10,014,165Radiation sensor device for high energy photons20189,761,458'Apparatus and method for reactive ion etching'20178,961,694'Plasma generator and method for cleaning an object'20158,749,245'Ion gauge, a monitoring system and a method for determining a total integrated concentration of substances having specific molecular weight in a gas sample'20148,480,807'Method and an apparatus for cleaning and/or sterilization of an object provided in a sealed enclosure'20138,446,560'Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method'20137,963,144'Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system'20117,959,310'Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element'20117,624,617'Gas analyzing system, lithographic apparatus and method of improving a sensitivity of a gas analyzing system'20097,115,886'Lithographic projection apparatus, device manufacturing method and device manufactured thereby'20066,862,075'Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby'20056,828,569'Lithographic projection apparatus, device manufacturing method and device manufactured thereby'20046,724,460'Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects'20046,614,505'Lithographic projection apparatus, device manufacturing method, and device manufactured thereby'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2013Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2003–2017Based in Delft, NL· patent location history
2013–2017Patents assigned to KOSTER NORBERTUS BENEDICTUS (5)· patent assignee history
2013–2018Patents assigned to TNO (4)· patent assignee history
2013–2015Patents assigned to WIERINGA FOKKO PIETER (2)· patent assignee history
2013Patents assigned to AGOVIC KEMAL (1)· patent assignee history
2018Based in 's-Hertogenbosch, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV92003–2013
KOSTER NORBERTUS BENEDICTUSself52013–2017
TNO42013–2018
WIERINGA FOKKO PIETER22013–2015
AGOVIC KEMAL12013
Locations
LocationPatentsSpan
Delft, NL132003–2017
's-Hertogenbosch, NL12018