Inventor
Hsin-Ta Hsieh
Inventor
New Taipei, TW
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B29Cprimary
B29CShaping or joining of plastics20%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering20%
H04NPictorial communication, e.g. television10%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts8%
B41JTypewriters8%
G05BControl or regulating systems in general8%
G06TImage data processing or generation, in general6%
B41MPrinting, duplicating, marking, or copying processes4%
G02BOptical elements, systems or apparatus4%
B29DProducing particular articles from plastics or from substances in a plastic state2%
PatentTitleYear
10,780,652Printing method for color compensation of 3D printer202010,773,4553D printing method using strengthened auxiliary wall202010,710,376Inkjet position adjustment method and three-dimensional printing equipment202010,678,215Three dimensional printing method and three dimensional printing apparatus202010,661,553Slicing method for 3D colored object, updating method for slicing data, and printing system for using the same202010,654,258Three dimensional printing apparatus and controlling method thereof202010,611,142Inkjet width adjustment method and three-dimensional printing equipment202010,596,801Three-dimensional printing apparatus and inkjet coloring method thereof202010,303,158Three dimension printing coloring method and three dimension printing system201910,245,782Method for printing a model for 3D printer20199,785,137'Five-axis flank milling system for machining curved surface and toolpath planning method thereof'20179,685,520'Manufacturing method of semiconductor device'20179,140,897'Optical system, optical module and method of manufacture thereof'20157,713,453'Method for fabricating microlenses and process of single photomask pattern-based photolithography'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2015Patents assigned to UNIV NAT TAIWAN (2)· patent assignee history
2010–2015Based in Taipei, TW· patent location history
2015–2017Patents assigned to HSIEH HSIN-TA (2)· patent assignee history
2017Based in Hsinchu, TW· patent location history
2017Based in Tainan, TW· patent location history
2019–2020Patents assigned to KINPO ELECT INC (10)· patent assignee history
2019–2020Patents assigned to XYZPRINTING INC (10)· patent assignee history
2019–2020Based in New Taipei, TW· patent location history
2020Patents assigned to CAL COMP ELECTRONICS & COMMUNICATIONS COMPANY LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KINPO ELECT INC | 10 | 2019–2020 |
| XYZPRINTING INC | 10 | 2019–2020 |
| HSIEH HSIN-TAself | 2 | 2015–2017 |
| UNIV NAT TAIWAN | 2 | 2010–2015 |
| CAL COMP ELECTRONICS & COMMUNICATIONS COMPANY LTD | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| New Taipei, TW | 10 | 2019–2020 |
| Taipei, TW | 2 | 2010–2015 |
| Hsinchu, TW | 1 | 2017 |
| Tainan, TW | 1 | 2017 |