Inventor
KAZUHIRO KATAYAMA
Inventor
JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
C07CAcyclic or carbocyclic compounds22%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds16%
C07DHeterocyclic compounds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
C08LCompositions of macromolecular compounds3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G16BBioinformatics, i.e. information and communication technology [ict] specially adapted for genetic or protein-related data processing in computational molecular biology3%
G16HHealthcare informatics, i.e. information and communication technology [ict] specially adapted for the handling or processing of medical or healthcare data3%
PatentTitleYear
12,535,733Molecular resist composition and patterning process202612,275,693Onium salt, chemically amplified resist composition and patterning process202512,216,401Sulfonium salt, chemically amplified resist composition, and patterning process202512,159,718Method for evaluating pancreatic cancer, pancreatic cancer evaluating apparatus, pancreatic cancer evaluating method, pancreatic cancer evaluating program product, pancreatic cancer evaluating system and information communication terminal apparatus202411,953,827Molecular resist composition and patterning process202411,940,728Molecular resist composition and patterning process202411,774,853Resist composition and patterning process202311,687,000Sulfonium compound, chemically amplified resist composition, and patterning process202311,560,355Onium salt, chemically amplified resist composition, and patterning process202311,448,961Iodonium salt, resist composition, and pattern forming process2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SHINETSU CHEMICAL CO (9)· patent assignee history
2022–2026Based in JP· patent location history
2024Patents assigned to AJINOMOTO KK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 9 | 2022–2026 |
| AJINOMOTO KK | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 10 | 2022–2026 |