Inventor

Ma. Fatimo Seijo

Inventor

Hayward, CA, US

Overview

2012

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Kprimary

C09KMaterials for miscellaneous applications, not provided for elsewhere17%

C11DDetergent compositions17%

C23FNon-mechanical removal of metallic material from surface17%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis17%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2012Patents assigned to ADVANCED TECH MATERIALS (1)· patent assignee history

2012Patents assigned to BERNHARD DAVID (1)· patent assignee history

2012Patents assigned to NGUYEN LONG (1)· patent assignee history

2012Patents assigned to SEIJO MA FATIMO (1)· patent assignee history

2012Patents assigned to WOJTCZAK WILLIAM A (1)· patent assignee history

2012Based in Hayward, CA, US· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Hayward, California, US	1	2012