Inventor
Takaharu Nagai
Inventor
Tokyo, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
B29CShaping or joining of plastics14%
H01LSemiconductor devices10%
B05DProcesses for applying fluent materials to surfaces, in general5%
PatentTitleYear
10,634,990Photomask and methods for manufacturing and correcting photomask202010,429,732Imprint method and imprint mold manufacturing method201910,394,118Photomask and methods for manufacturing and correcting photomask201910,279,538Imprinting method and imprinting apparatus201910,265,724Imprint mold and imprint method201910,048,580Photomask and methods for manufacturing and correcting photomask20189,519,211'Photomask and methods for manufacturing and correcting photomask'20168,974,987'Photomask and methods for manufacturing and correcting photomask'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2020Patents assigned to DAINIPPON PRINTING CO LTD (8)· patent assignee history
2015Patents assigned to HAYANO KATSUYA (1)· patent assignee history
2015Patents assigned to MOHRI HIROSHI (1)· patent assignee history
2015Patents assigned to MORIKAWA YASUTAKA (1)· patent assignee history
2015Patents assigned to NAGAI TAKAHARU (1)· patent assignee history
2015–2020Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DAINIPPON PRINTING CO LTD | 8 | 2015–2020 |
| HAYANO KATSUYA | 1 | 2015 |
| MOHRI HIROSHI | 1 | 2015 |
| MORIKAWA YASUTAKA | 1 | 2015 |
| NAGAI TAKAHARUself | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 8 | 2015–2020 |