Inventor
Yasuhiro Omura
Inventor
Kumagaya, JP
Overview
Patents· 91 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
G02BOptical elements, systems or apparatus36%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H01LSemiconductor devices3%
G01HMeasurement of mechanical vibrations or ultrasonic, sonic or infrasonic waves2%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
B21BRolling of metal1%
B24CAbrasive or related blasting with particulate material1%
G01NInvestigating or analysing materials by determining their chemical or physical properties1%
C30BSingle-crystal growth1%
PatentTitleYear
10,156,792Projection optical system, exposure apparatus, and exposure method201810,048,602Exposure apparatus, exposure method, and method for producing device20189,933,705Reduction projection optical system, exposure apparatus, and exposure method20189,904,174'Reduction projection optical system, exposure apparatus, and exposure method'20189,891,539'Projection optical system, exposure apparatus, and exposure method'20189,846,366Projection optical system, exposure apparatus, and exposure method20179,823,588'Projection optical system, exposure apparatus, and exposure method'20179,791,781'Reduction projection optical system, exposure apparatus, and exposure method'20179,606,443'Reducing immersion projection optical system'20179,568,834'Reducing immersion projection optical system'20179,500,943'Projection optical system, exposure apparatus, and exposure method'20169,470,968'Projection optical system, exposure apparatus, and exposure method'20169,442,360'Projection optical system, exposure apparatus, and exposure method'20169,429,851'Projection optical system, exposure apparatus, and exposure method'20169,360,763'Projection optical system, exposure apparatus, and exposure method'20169,316,921'Exposure apparatus, exposure method, and method for producing device'20169,310,696'Projection optical system, exposure apparatus, and exposure method'20169,086,635'Projection optical system, exposure apparatus, and exposure method'20159,081,295'Catadioptric projection optical system, exposure apparatus, and exposure method'20158,854,601'Projection optical system, exposure apparatus, and exposure method'20148,665,418'Projection optical system, exposure apparatus, and device manufacturing method'20148,605,252'Exposure apparatus, exposure method, and method for producing device'20138,436,983'Optical system, exposure system, and exposure method'20138,351,021'Optical system, exposure system, and exposure method'20138,339,578'Optical system, exposure system, and exposure method'20128,253,924'Exposure method, exposure apparatus and device manufacturing method'20128,208,119'Exposure apparatus, exposure method, and method for producing device'20128,102,508'Projection optical system, exposure apparatus, and exposure method'20128,009,271'Projection optical system, exposure apparatus, exposure system, and exposure method'20117,990,609'Catadioptric imaging system with prolate spheroidal-shaped mirrors'20117,978,310'Projection optical system, exposure system, and exposure method'20117,936,441'Projection optical system, exposure apparatus, and exposure method'20117,710,653'Projection optical system, exposure system, and exposure method'20107,701,640'Projection optical system and method for photolithography and exposure apparatus and method using same'20107,688,517'Projection optical system and method for photolithography and exposure apparatus and method using same'20107,688,422'Projection optical system, exposure system, and exposure method'20107,619,827'Projection optical system and method for photolithography and exposure apparatus and method using same'20097,609,455'Projection optical system and method for photolithography and exposure apparatus and method using same'20097,580,197'Projection optical system and method for photolithography and exposure apparatus and method using same'20097,557,997'Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element'20097,551,362'Projection optical system and method for photolithography and exposure apparatus and method using same'20097,471,374'Projection optical system, exposure apparatus, and exposure method'20087,457,042'Projection optical system, exposure apparatus, and exposure method'20087,362,508'Projection optical system and method for photolithography and exposure apparatus and method using same'20087,348,575'Projection optical system, exposure apparatus, and exposure method'20087,319,508'Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices'20087,312,463'Projection optical system, exposure apparatus, and exposure method'20077,309,870'Projection optical system, exposure apparatus, and exposure method'20077,301,605'Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices'20077,154,585'Projection optical system, exposure apparatus, and device production method'20066,909,492'Projection optical system, exposure apparatus and exposure method'20056,903,803'Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus'20056,864,961'Projection exposure methods and apparatus, and projection optical systems'20056,844,915'Optical system and exposure apparatus provided with the optical system'20056,844,982'Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system'20056,831,731'Projection optical system and an exposure apparatus with the projection optical system'20046,788,389'Production method of projection optical system'20046,768,537'Projection optical system, exposure apparatus, and exposure method'20046,757,051'Projection optical system, manufacturing method thereof, and projection exposure apparatus'20046,750,948'PROJECTION OPTICAL SYSTEM, PROJECTION EXPOSURE APPARATUS HAVING THE PROJECTION OPTICAL SYSTEM, PROJECTION METHOD THEREOF, EXPOSURE METHOD THEREOF AND FABRICATING METHOD FOR FABRICATING A DEVICE USING THE PROJECTION EXPOSURE APPARATUS'20046,714,280'Projection optical system, projection exposure apparatus, and projection exposure method'20046,707,601'Exposure apparatus and method'20046,674,513'Projection exposure methods and apparatus, and projection optical systems'20046,661,499'Projection exposure apparatus with a catadioptric projection optical system'20036,646,797'Exposure apparatus and method'20036,639,734'Catadioptric imaging system and a projection exposure apparatus provided with said imaging system'20036,639,732'Projection exposure apparatus and method'20036,606,144'Projection exposure methods and apparatus, and projection optical systems'20036,556,353'Projection optical system, projection exposure apparatus, and projection exposure method'20036,512,641'Projection exposure apparatus and method'20036,473,243'Catadioptric imaging system and a projection exposure apparatus provided with said imaging system'20026,466,303'Projection exposure apparatus with a catadioptric projection optical system'20026,451,507'Exposure apparatus and method'20026,452,723'Exposure apparatus and method'20026,362,926'Projection exposure apparatus and method'20026,208,473'Catadioptric projection lens'20016,195,213'Projection exposure apparatus and method'20016,104,542'Wide-angle eyepiece lens with large eye relief'20006,081,382'Catadioptric reduction projection optical system'20006,069,749'Catadioptric reduction optical system'20005,969,802'Exposure apparatus'19995,877,900'Eyepiece with wide field of view'19995,835,284'Catadioptric optical system and adjusting method'19985,835,275'Catadioptric system for photolithography'19985,815,317'Eyepiece with broad visibility'19985,805,357'Catadioptric system for photolithography'19985,121,634'Ultrasonic microscope'19925,042,304'Ultrasonic microscope'19914,986,125'Ultrasonic microscope'19914,269,052'Mechanical descaling device'19814,251,956'Apparatus for descaling metal strip'1981Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–1992Patents assigned to OLYMPUS OPTICAL CO (3)· patent assignee history
1991Based in Hachioji, JP· patent location history
1992–2016Based in Tokyo, JP· patent location history
1998–2018Patents assigned to NIKON CORP (78)· patent assignee history
2001–2004Based in Chuo-ku, JP· patent location history
2003–2018Based in Kumagaya, JP· patent location history
2008–2018Based in Kounosu, JP· patent location history
2012–2017Patents assigned to OMURA YASUHIRO (12)· patent assignee history
2012–2013Patents assigned to OWA SOICHI (3)· patent assignee history
2012–2013Patents assigned to HIRUKAWA SHIGERU (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 78 | 1998–2018 |
| OMURA YASUHIROself | 12 | 2012–2017 |
| OLYMPUS OPTICAL CO | 3 | 1991–1992 |
| OWA SOICHI | 3 | 2012–2013 |
| HIRUKAWA SHIGERU | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kumagaya, JP | 31 | 2003–2018 |
| Tokyo, JP | 25 | 1992–2016 |
| Kounosu, JP | 20 | 2008–2018 |
| Chuo-ku, JP | 6 | 2001–2004 |
| Hachioji, JP | 2 | 1991 |