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Inventor

Bas Willems

Inventor
Nijmegen, NL

Overview

2→
Patents
2019–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
10,916,453Lithographic apparatus, method of transferring a substrate and device manufacturing method202110,409,174Lithographic apparatus, method of transferring a substrate and device manufacturing method2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2021Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2019–2021Based in Nijmegen, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22019–2021
Locations
LocationPatentsSpan
Nijmegen, NL22019–2021