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Inventor

Masashi IMANAKA

Inventor
JP

Overview

2→
Patents
2025
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C23CCoating metallic material11%
G01BMeasuring length, thickness or similar linear dimensions11%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G06NComputing arrangements based on specific computational models11%
G06TImage data processing or generation, in general11%
H01JElectric discharge tubes or discharge lamps11%
H05HPlasma technique11%
PatentTitleYear
12,442,635Substrate processing apparatus, substrate processing method, and storage medium202512,315,700Plasma processing apparatus and ceiling wall2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history
2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD22025
Locations
LocationPatentsSpan
JP22025