Inventor

Yevgeniy Konstantinovich Shmarev

Inventor

Lagrangeville, NY, US

Overview

21→

Patents

2009–2021

Patent span

Physics

Primary field (CPC G)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%

G01NInvestigating or analysing materials by determining their chemical or physical properties28%

G02BOptical elements, systems or apparatus23%

G01BMeasuring length, thickness or similar linear dimensions4%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%

PatentTitleYear

11,126,007Beam splitting prism systems2021 10,866,526Metrology method and device2020 10,754,259Method and device for pupil illumination in overlay and critical dimension sensors2020 10,747,010Beam splitting prism systems2020 10,724,961Method and device for focusing in an inspection system2020 10,107,761Method and device for focusing in an inspection system2018 10,048,591Catadioptric illumination system for metrology2018 9,904,173'Method and apparatuses for optical pupil symmetrization'2018 9,285,687'Inspection apparatus, lithographic apparatus, and device manufacturing method'2016 9,069,260'Catadioptric illumination system for metrology'2015 9,046,754'EUV mask inspection system'2015 8,982,481'Catadioptric objective for scatterometry'2015 8,934,084'System and method for printing interference patterns having a pitch in a lithography system'2015 8,623,576'Time differential reticle inspection'2014 8,189,203'Reticle inspection systems and method'2012 8,164,740'Illumination system coherence remover with two sets of stepped mirrors'2012 8,159,651'Illumination system coherence remover with a series of partially reflective surfaces'2012 8,120,001'Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method'2012 7,633,689'Catadioptric optical system for scatterometry'2009 7,630,136'Optical integrators for lithography systems and methods'2009 7,589,832'Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2021Patents assigned to ASML HOLDING NV (19)· patent assignee history

2009–2020Patents assigned to ASML NETHERLANDS BV (7)· patent assignee history

2009–2021Based in Lagrangeville, NY, US· patent location history

2012–2020Patents assigned to SHMAREV YEVGENIY KONSTANTINOVICH (8)· patent assignee history

2012–2016Patents assigned to CATEY ERIC BRIAN (4)· patent assignee history

2012–2016Patents assigned to JOOBEUR ADEL (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML HOLDING NV	19	2009–2021
SHMAREV YEVGENIY KONSTANTINOVICHself	8	2012–2020
ASML NETHERLANDS BV	7	2009–2020
CATEY ERIC BRIAN	4	2012–2016
JOOBEUR ADEL	4	2012–2016

Locations

Location	Patents	Span
Lagrangeville, New York, US	21	2009–2021