LexDanaLexDanabeta
Inventor

LEONARDO GABRIEL MONTILLA

Inventor
US

Overview

1→
Patents
2025
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
12,461,457Asymmetry extended grid model for wafer alignment2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12025
Locations
LocationPatentsSpan
US12025