Inventor

Tsui Jung Yang

Inventor
Hsinchu, TW

Overview

2→
Patents
2018–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation11%
C02FTreatment of water, waste water, sewage, or sludge11%
C07CAcyclic or carbocyclic compounds11%
C07DHeterocyclic compounds11%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium11%
H01LSemiconductor devices11%
H10HInorganic light-emitting semiconductor devices having potential barriers11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
Y02ATechnologies for adaptation to climate change11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to IND TECH RES INST (1)· patent assignee history
2018–2021Based in Hsinchu, TW· patent location history
2021Patents assigned to EPISTAR CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EPISTAR CORP12021
IND TECH RES INST12018
Locations
LocationPatentsSpan
Hsinchu, TW22018–2021