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Inventor

Taiga Uno

Inventor
Kanagawa, JP

Overview

13→
Patents
1998–2020
Patent span
Physics
Primary field (CPC G)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices72%
G06FElectric digital data processing11%
G16ZInformation and communication technology [ict] specially adapted for specific application fields, not otherwise provided for6%
H01LSemiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
10,852,648Mask pattern correction system, and semiconductor device manufacturing method utilizing said correction system20209,268,208'Pattern generating method, pattern forming method, and pattern generating program'20169,257,367'Integrated circuit device, method for producing mask layout, and program for producing mask layout'20168,617,773'Method of correcting mask pattern, computer program product, and method of manufacturing semiconductor device'20138,527,914'Flare map calculating method and recording medium'20138,507,160'Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable medium'20138,443,311'Flare value calculation method, flare correction method, and computer program product'20138,196,071'Creating mask data of integrated circuit patterns using calculated etching conversion difference'20128,039,177'Method of correcting a flare and computer program product'20116,622,297'Pattern correcting method and pattern verifying method'20036,243,855'Mask data design method'20016,004,701'Method for designing Levenson photomask'19995,795,683'Method and a system for designing a photomask for use in manufacture of a semiconductor device'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2016Patents assigned to TOSHIBA KK (12)· patent assignee history
1998–2001Based in Kawasaki, JP· patent location history
2003Based in Numazu, JP· patent location history
2011Based in Ibaraki, JP· patent location history
2012–2016Patents assigned to UNO TAIGA (6)· patent assignee history
2012–2016Patents assigned to KOTANI TOSHIYA (4)· patent assignee history
2012–2016Patents assigned to MASHITA HIROMITSU (3)· patent assignee history
2012–2020Based in Kanagawa, JP· patent location history
2013Patents assigned to ARISAWA YUKIYASU (3)· patent assignee history
2013Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK121998–2016
UNO TAIGAself62012–2016
KOTANI TOSHIYA42012–2016
ARISAWA YUKIYASU32013
MASHITA HIROMITSU32012–2016
Locations
LocationPatentsSpan
Kanagawa, JP72012–2020
Kawasaki, JP31998–2001
Yokohama, JP12013
Ibaraki, JP12011
Numazu, JP12003