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Inventor

Taichi Abe

Inventor
Kamisu, JP

Overview

12→
Patents
2010–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Dprimary
C07DHeterocyclic compounds12%
A61KPreparations for medical, dental or toiletry purposes9%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations9%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
H01LSemiconductor devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
H05BElectric heating5%
H10KOrganic electric solid-state devices5%
PatentTitleYear
11,126,084Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound202110,822,277Oxidation-induced self-healing ceramic composition containing healing activator, method for producing same, use of same, and method for enhancing functionality of oxidation-induced self-healing ceramic compositions202010,822,307High-purity quinoline derivative and method for manufacturing same202010,407,393High-purity quinoline derivative and method for manufacturing same201910,319,020Information processing device, information processing method, program and storage medium201910,259,791High-purity quinoline derivative and method for manufacturing same201910,000,458Production method of 1, 2, 4-triazole compound20189,735,374'Metal complex and light-emitting device containing the metal complex'20179,705,097'Metal complex and light-emitting device containing the metal complex'20178,492,276'Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method'20138,480,920'Chemical mechanical polishing aqueous dispersion, method of preparing the same, chemical mechanical polishing aqueous dispersion preparation kit, and chemical mechanical polishing method'20137,754,894'Crystalline sulfonamide-containing indole compound and process for preparing the same'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2020Patents assigned to EISAI R&D MAN CO LTD (4)· patent assignee history
2010–2020Based in Kamisu, JP· patent location history
2013–2021Patents assigned to JSR CORP (3)· patent assignee history
2013Patents assigned to ABE TAICHI (2)· patent assignee history
2013Based in Yokkaichi, JP· patent location history
2017–2018Patents assigned to SUMITOMO CHEMICAL CO (3)· patent assignee history
2017Patents assigned to NAT INST ADVANCED IND SCIENCE & TECH (2)· patent assignee history
2017Based in Ibaraki, JP· patent location history
2018–2020Based in Tsukuba, JP· patent location history
2019–2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EISAI R&D MAN CO LTD42010–2020
JSR CORP32013–2021
SUMITOMO CHEMICAL CO32017–2018
ABE TAICHIself22013
NAT INST ADVANCED IND SCIENCE & TECH22017
Locations
LocationPatentsSpan
Kamisu, JP42010–2020
Tokyo, JP22019–2021
Tsukuba, JP22018–2020
Ibaraki, JP22017
Yokkaichi, JP22013