Inventor
Allen L. Evans
Inventor
Austin, TX, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1021%
C23CCoating metallic material7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
Y10TTechnical subjects covered by former us classification7%
B24BMachines, devices, or processes for grinding or polishing4%
G01KMeasuring temperature4%
G05BControl or regulating systems in general4%
G11CStatic stores4%
H03KPulse technique4%
PatentTitleYear
8,643,083'Electronic devices with ultraviolet blocking layers'20148,202,810'Low-H plasma treatment with N2 anneal for electronic memory devices'20128,171,627'Method of forming an electronic device'20126,684,122'Control mechanism for matching process parameters in a multi-chamber process tool'20046,649,541'Method for preventing or reducing delamination of deposited insulating layers'20036,558,963'Method and system for controlling the plasma treatment of a titanium nitride layer formed by a chemical vapor deposition process'20036,514,865'Method of reducing interlayer dielectric thickness variation feeding into a planarization process'20036,512,991'Method and apparatus for reducing deposition variation by modeling post-clean chamber performance'20036,469,518'Method and apparatus for determining measurement frequency based on hardware age and usage'20026,442,054'Sense amplifier for content addressable memory'20026,403,151'Method for controlling optical properties of antireflective coatings'20026,291,253'Feedback control of deposition thickness based on polish planarization'20016,274,472'Tungsten interconnect method'20016,271,112'Interlayer between titanium nitride and high density plasma oxide'20015,895,259'Polysilicon diffusion doping method employing a deposited doped oxide layer with a highly uniform thickness'19994,486,670'Monolithic CMOS low power digital level shifter'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984Based in Colorado Springs, CO, US· patent location history
1999–2004Patents assigned to ADVANCED MICRO DEVICES INC (11)· patent assignee history
1999–2004Based in Austin, TX, US· patent location history
2002Based in Roseville, CA, US· patent location history
2003–2014Based in Dripping Springs, TX, US· patent location history
2012–2014Patents assigned to SPANSION LLC (3)· patent assignee history
2012–2014Patents assigned to BRENNAN WILLIAM (2)· patent assignee history
2012–2014Patents assigned to EVANS ALLEN (2)· patent assignee history
2012–2014Patents assigned to HANCE BRYON K (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADVANCED MICRO DEVICES INC | 11 | 1999–2004 |
| SPANSION LLC | 3 | 2012–2014 |
| BRENNAN WILLIAM | 2 | 2012–2014 |
| EVANS ALLENself | 2 | 2012–2014 |
| HANCE BRYON K | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 9 | 1999–2004 |
| Dripping Springs, Texas, US | 5 | 2003–2014 |
| Roseville, California, US | 1 | 2002 |
| Colorado Springs, CO, US | 1 | 1984 |