Inventor
Kenichi Iwashita
Inventor
Tokyo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H01LSemiconductor devices15%
H05KPrinted circuits15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
C08LCompositions of macromolecular compounds8%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
PatentTitleYear
10,656,521Photosensitive resin composition, photosensitive element, cured product, semiconductor device, method for forming resist pattern, and method for producing circuit substrate202010,388,608Semiconductor device and method for manufacturing same201910,324,375Photosensitive resin composition, photosensitive film, and method for forming resist pattern20199,841,678'Photosensitive resin composition, photosensitive element, semiconductor device and method for forming resist pattern'20179,829,791Photosensitive resin composition, photosensitive element, semiconductor device and method for forming resist pattern20178,298,747'Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012Patents assigned to HITACHI CHEM DUPONT MICROSYS (1)· patent assignee history
2012Patents assigned to IWASHITA KENICHI (1)· patent assignee history
2012Patents assigned to MINEGISHI TOMONORI (1)· patent assignee history
2012Patents assigned to NOGITA RIKA (1)· patent assignee history
2012Based in Ibaraki, JP· patent location history
2017–2020Patents assigned to HITACHI CHEMICAL CO LTD (5)· patent assignee history
2017–2020Based in Tokyo, JP· patent location history
2019Based in Hitachi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI CHEMICAL CO LTD | 5 | 2017–2020 |
| HITACHI CHEM DUPONT MICROSYS | 1 | 2012 |
| IWASHITA KENICHIself | 1 | 2012 |
| MINEGISHI TOMONORI | 1 | 2012 |
| NOGITA RIKA | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 4 | 2017–2020 |
| Hitachi, JP | 1 | 2019 |
| Ibaraki, JP | 1 | 2012 |