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Inventor

Kei Arao

Inventor
Niigata, JP

Overview

2→
Patents
2007
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H05BElectric heating33%
PatentTitleYear
7,195,855'Negative-type photosensitive resin composition containing epoxy compound'20077,195,858'Negative type photosensitive resin composition containing a phenol-biphenylene resin'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007Patents assigned to ROHM & HAAS ELECT MAT (2)· patent assignee history
2007Based in Niigata, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ROHM & HAAS ELECT MAT22007
Locations
LocationPatentsSpan
Niigata, JP22007