LexDanaLexDanabeta
Inventor

Hirokazu Kawashima

Inventor
Chiba, JP

Overview

32→
Patents
2013–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices16%
C23CCoating metallic material13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
C04BLime, magnesia9%
H01LSemiconductor devices9%
F01DNon-positive displacement machines or engines, e.g. steam turbines4%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants2%
Y10TTechnical subjects covered by former us classification2%
B82YSpecific uses or applications of nanostructures2%
C09KMaterials for miscellaneous applications, not provided for elsewhere2%
PatentTitleYear
11,040,705Windshield wiper connector202111,004,761Packaging of a semiconductor device with dual sealing materials202110,932,222Power storage management system, information processing apparatus, power storage apparatus, method of operating power storage management system, and method of operating information processing apparatus202110,833,201Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms202010,809,820Touch pen and display device using touch pen202010,709,028Touch pen and display device using touch pen202010,649,257Cover mounting structure and display device202010,644,163Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms202010,487,658Turning device201910,443,513Emergency shutoff device and emergency shutoff system provided with same201910,227,898Multi-valve steam valve and steam turbine201910,227,894Rotary system201910,082,044Turning apparatus20189,269,573'Thin film transistor having crystalline indium oxide semiconductor film'20169,209,257'Oxide sintered body and sputtering target'20159,136,338'Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor'20159,054,196'Sputtering target comprising an oxide sintered body comprising In, Ga, and Zn'20158,981,369'Field effect transistor using oxide semiconductor and method for manufacturing the same'20158,871,119'Composite oxide sintered body and sputtering target comprising same'20148,795,554'Sputtering target for oxide semiconductor, comprising InGaO3(ZnO) crystal phase and process for producing the sputtering target'20148,791,457'Oxide semiconductor field effect transistor and method for manufacturing the same'20148,784,699'In-Ga-Zn-type oxide, oxide sintered body, and sputtering target'20148,753,548'Composite oxide sintered body and sputtering target comprising same'20148,723,175'Oxide semiconductor field effect transistor and method for manufacturing the same'20148,664,136'Indium oxide sintered compact and sputtering target'20148,647,537'Oxide sintered body and sputtering target'20148,641,932'Sintered complex oxide and sputtering target comprising same'20148,623,511'Sputtering target for oxide thin film and process for producing the sputtering target'20148,461,583'Oxide semiconductor field effect transistor and method for manufacturing the same'20138,455,371'Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor'20138,445,903'Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing same'20138,384,077'Field effect transistor using oxide semicondutor and method for manufacturing the same'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2020Patents assigned to IDEMITSU KOSAN CO (21)· patent assignee history
2013–2020Patents assigned to KAWASHIMA HIROKAZU (14)· patent assignee history
2013–2020Patents assigned to YANO KOKI (14)· patent assignee history
2013–2020Patents assigned to INOUE KAZUYOSHI (9)· patent assignee history
2013–2016Patents assigned to KASAMI MASASHI (7)· patent assignee history
2013–2020Based in Chiba, JP· patent location history
2013–2016Based in Sodegaura, JP· patent location history
2018–2019Based in Hiroshima, JP· patent location history
2020Based in Sakai, JP· patent location history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IDEMITSU KOSAN CO212013–2020
KAWASHIMA HIROKAZUself142013–2020
YANO KOKI142013–2020
INOUE KAZUYOSHI92013–2020
KASAMI MASASHI72013–2016
Locations
LocationPatentsSpan
Chiba, JP122013–2020
Sodegaura, JP92013–2016
Hiroshima, JP52018–2019
Sakai, JP32020
Tokyo, JP22021