Inventor
Daisuke Morisawa
Inventor
Nirasaki, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices17%
C23CCoating metallic material14%
G05BControl or regulating systems in general14%
F04BPositive-displacement machines for liquids7%
Y02PClimate change mitigation technologies in the production or processing of goods7%
B63BShips or other waterborne vessels3%
B63HMarine propulsion or steering3%
F16KValves3%
H01JElectric discharge tubes or discharge lamps3%
PatentTitleYear
11,101,154Method of processing target substrate202110,186,422Substrate processing apparatus20199,845,531Substrate processing system20179,828,675Processing apparatus and processing method20179,646,864'Substrate processing system and substrate transfer control method'20178,255,072'Substrate processing apparatus, program, storage medium and conditioning necessity determining method'20127,987,012'Control device of substrate processing apparatus and control program therefor'20117,690,898'Control valve for variable displacement compressor'20107,266,418'Substrate processing apparatus, history information recording method, history information recording program, and history information recording system'20077,128,304'Control valve for variable capacity compressors'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2010Patents assigned to FUJIKOKI CORP (2)· patent assignee history
2006Based in Tokyo, JP· patent location history
2007–2021Patents assigned to TOKYO ELECTRON LTD (8)· patent assignee history
2007–2021Based in Nirasaki, JP· patent location history
2010Based in Setagaya, JP· patent location history
2012Patents assigned to MORISAWA DAISUKE (1)· patent assignee history
2017Based in Yamanshi, JP· patent location history
2017Based in Yamanashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 8 | 2007–2021 |
| FUJIKOKI CORP | 2 | 2006–2010 |
| MORISAWA DAISUKEself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 6 | 2007–2021 |
| Yamanshi, JP | 1 | 2017 |
| Yamanashi, JP | 1 | 2017 |
| Setagaya, JP | 1 | 2010 |
| Tokyo, JP | 1 | 2006 |