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Inventor

Nico Antonius Hubertus Johannes Boonen

Inventor
Geldrop, NL

Overview

2→
Patents
2009–2014
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
Y10TTechnical subjects covered by former us classification20%
PatentTitleYear
8,817,228'Cooling arrangement and lithographic apparatus comprising a resilient wall creating a gap between a detector module housing and a heat sink of the cooling arrangement'20147,506,542'Tack measuring device'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009Patents assigned to TNO (1)· patent assignee history
2009–2014Based in Geldrop, NL· patent location history
2014Patents assigned to ASML NETHERLAND BV (1)· patent assignee history
2014Patents assigned to BOONEN NICO ANTONIUS HUBERTUS JOHANNES (1)· patent assignee history
2014Patents assigned to KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS (1)· patent assignee history
2014Patents assigned to KOOIKER ALLARD EELCO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLAND BV12014
BOONEN NICO ANTONIUS HUBERTUS JOHANNESself12014
KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS12014
KOOIKER ALLARD EELCO12014
TNO12009
Locations
LocationPatentsSpan
Geldrop, NL22009–2014