Inventor
Hai Hong Wang
Inventor
Fremont, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
B23KSoldering or unsoldering13%
F16BDevices for fastening or securing constructional elements or machine parts together, e.g. nails, bolts, circlips, clamps, clips or wedges13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
PatentTitleYear
10,981,253Structure having stress protected groove weld and structural members forming the same20216,964,875'Array of gate dielectric structures to measure gate dielectric thickness and parasitic capacitance'20056,841,832'Array of gate dielectric structures to measure gate dielectric thickness and parasitic capacitance'20056,713,357'Method to reduce parasitic capacitance of MOS transistors'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2005Patents assigned to ADVANCED MICRO DEVICES INC (3)· patent assignee history
2004–2005Based in Fremont, CA, US· patent location history
2021Patents assigned to CATERPILLAR INC (1)· patent assignee history
2021Based in Peoria, IL, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADVANCED MICRO DEVICES INC | 3 | 2004–2005 |
| CATERPILLAR INC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 3 | 2004–2005 |
| Peoria, Illinois, US | 1 | 2021 |