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Inventor

Pierre Eyben

Inventor
Leuven, BE

Overview

2→
Patents
2004–2017
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures29%
G01QScanning-probe techniques or apparatus29%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
PatentTitleYear
9,588,137'Method for determining local resistivity and carrier concentration using scanning spreading resistance measurement set-up'20176,823,723'Method and apparatus for performing atomic force microscopy measurements'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to IMEC INTER UNI MICRO ELECTR (1)· patent assignee history
2004Based in Luik, BE· patent location history
2017Patents assigned to IMEC (1)· patent assignee history
2017Based in Leuven, BE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IMEC12017
IMEC INTER UNI MICRO ELECTR12004
Locations
LocationPatentsSpan
Leuven, BE12017
Luik, BE12004