Inventor
Nyi O. Myo
Inventor
San Jose, CA, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
H01LSemiconductor devices16%
C30BSingle-crystal growth14%
Y10TTechnical subjects covered by former us classification6%
B05CApparatus for applying fluent materials to surfaces, in general3%
B23KSoldering or unsoldering3%
H01JElectric discharge tubes or discharge lamps3%
H05BElectric heating3%
Y02TClimate change mitigation technologies related to transportation3%
PatentTitleYear
11,021,795Multi zone spot heating in epi202111,021,790Liner for processing chamber202110,930,543Thermal processing susceptor202110,770,319EPI thickness tuning by pulse or profile spot heating202010,731,272Methods and apparatus for deposition processes202010,519,547Susceptor design to eliminate deposition valleys in the wafer201910,269,614Susceptor design to reduce edge thermal peak201910,260,164Methods and apparatus for deposition processes201910,074,555Non-contact substrate processing201810,062,598Thermal processing susceptor20189,890,455'Pre-heat ring designs to increase deposition uniformity and substrate throughput'20189,695,508'Liner assembly for chemical vapor deposition chamber'20179,650,726'Methods and apparatus for deposition processes'20179,644,267'Multi-gas straight channel showerhead'20179,613,835'Heating lamp assembly'20179,499,905'Methods and apparatus for the deposition of materials on a substrate'20169,277,595'Heating lamp having base to facilitate reduced air flow about the heating lamp'20169,127,360'Epitaxial chamber with cross flow'20158,980,005'Liner assembly for chemical vapor deposition chamber'20158,481,118'Multi-gas straight channel showerhead'20138,388,853'Non-contact substrate processing'20138,343,279'Apparatuses for atomic layer deposition'20138,282,992'Methods for atomic layer deposition of hafnium-containing high-K dielectric materials'20128,217,574'Lamp with internal fuse system'20127,976,631'Multi-gas straight channel showerhead'2011D0613321'Liner with recessed panels'20107,674,352'System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2021Patents assigned to APPLIED MATERIALS INC (27)· patent assignee history
2010–2021Based in San Jose, CA, US· patent location history
2010–2013Based in Campbell, CA, US· patent location history
2012–2016Patents assigned to MYO NYI OO (4)· patent assignee history
2012–2013Patents assigned to DEATEN PAUL (2)· patent assignee history
2012–2013Patents assigned to KHER SHREYAS (2)· patent assignee history
2013–2018Patents assigned to MYO NYI O (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 27 | 2010–2021 |
| MYO NYI Oself | 6 | 2013–2018 |
| MYO NYI OOself | 4 | 2012–2016 |
| DEATEN PAUL | 2 | 2012–2013 |
| KHER SHREYAS | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 23 | 2010–2021 |
| Campbell, California, US | 4 | 2010–2013 |