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Inventor

Rieko Muraoka

Inventor
Yokohama, JP

Overview

2→
Patents
2004–2005
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general20%
C09DCoating compositions, e.g. paints, varnishes or lacquers20%
C11DDetergent compositions20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
6,851,873'Method and apparatus for removing organic films'20056,696,228'Method and apparatus for removing organic films'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2005Patents assigned to NOMURA MICRO SCIENCE KK (2)· patent assignee history
2004–2005Patents assigned to UMS CO LTD (2)· patent assignee history
2004–2005Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NOMURA MICRO SCIENCE KK22004–2005
UMS CO LTD22004–2005
Locations
LocationPatentsSpan
Yokohama, JP22004–2005