Inventor
Heeyoung Oh
Inventor
Seoul, KR
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G06FElectric digital data processing25%
C07CAcyclic or carbocyclic compounds13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%
Y10TTechnical subjects covered by former us classification13%
PatentTitleYear
9,470,975'Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same'20169,341,946'Photosensitive resin composition, pattern formed using same and display panel comprising same'20167,534,844'Monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009Patents assigned to IUCF HYU (1)· patent assignee history
2009Based in Paju-si, KR· patent location history
2016Patents assigned to LG CHEMICAL LTD (2)· patent assignee history
2016Based in Seoul, KR· patent location history
2016Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG CHEMICAL LTD | 2 | 2016 |
| IUCF HYU | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 1 | 2016 |
| Daejeon, KR | 1 | 2016 |
| Paju-si, KR | 1 | 2009 |