Inventor

Hideyuki Yamamoto

Inventor

Kudamatsu, JP

Overview

1978–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 90 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%

H01JElectric discharge tubes or discharge lamps20%

G05BControl or regulating systems in general7%

Y02PClimate change mitigation technologies in the production or processing of goods6%

G01NInvestigating or analysing materials by determining their chemical or physical properties4%

B23KSoldering or unsoldering3%

LOC103%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

G01BMeasuring length, thickness or similar linear dimensions2%

Y10TTechnical subjects covered by former us classification2%

PatentTitleYear

10,538,068Method for producing functional-substance thin film material, functional-substance thin film material, and laminate thereof2020 9,384,059'Comparing resource costs between allocation plans in a load balance apparatus'2016 9,080,334'Recyclable formwork'2015 9,074,378'Recyclable formwork'2015 8,567,417'Ultrasonic cleaning apparatus, ultrasonic cleaning method, and storage medium storing computer program for executing ultrasonic cleaning method'2013 8,097,048'Polyphenylene sulfide member and method for producing the same'2012 7,998,306'Substrate processing apparatus'2011 7,686,917'Plasma processing system and apparatus and a sample processing method'2010 7,611,993'Plasma processing method and plasma processing apparatus'2009 7,601,240'Disturbance-free, recipe-controlled plasma processing system and method'2009 7,526,948'Device and method for detecting foreign material on the surface of plasma processing apparatus'2009 7,473,332'Method for processing semiconductor'2009 7,464,152'Integrated service management system for remote customer support'2008 7,376,479'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'2008 7,343,217'System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation'2008 7,330,346'Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus'2008 7,277,237'AF control apparatus for zoom lens system'2007 7,183,715'Method for operating a semiconductor processing apparatus'2007 7,169,254'Plasma processing system and apparatus and a sample processing method'2007 7,166,480'Particle control device and particle control method for vacuum processing apparatus'2007 7,158,848'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'2007 7,147,747'Plasma processing apparatus and plasma processing method'2006 7,147,748'Plasma processing method'2006 7,126,697'Method and apparatus for determining endpoint of semiconductor element fabricating process'2006 7,122,096'Method and apparatus for processing semiconductor'2006 7,119,968'AF control apparatus'2006 7,107,115'Method for controlling semiconductor processing apparatus'2006 7,085,827'Integrated service management system for remote customer support'2006 7,062,347'Maintenance method and system for plasma processing apparatus'2006 7,058,470'Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor'2006 7,058,467'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'2006 7,009,715'Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed'2006 7,010,374'Method for controlling semiconductor processing apparatus'2006 6,939,433'Sample processing apparatus and sample processing system'2005 6,939,435'Plasma processing apparatus and processing method'2005 6,923,885'Plasma processing system and apparatus and a sample processing method'2005 6,916,396'Etching system and etching method'2005 6,911,157'Plasma processing method and apparatus using dynamic sensing of a plasma environment'2005 6,908,529'Plasma processing apparatus and method'2005 6,903,826'Method and apparatus for determining endpoint of semiconductor element fabricating process'2005 6,899,766'Diagnosis method for semiconductor processing apparatus'2005 6,888,094'Plasma processing method and plasma processing apparatus'2005 6,881,352'Disturbance-free, recipe-controlled plasma processing method'2005 6,879,867'Process monitoring device for sample processing apparatus and control method of sample processing apparatus'2005 6,866,744'Semiconductor processing apparatus and a diagnosis method therefor'2005 6,844,275'Heat-resistant fabric and method for production thereof'2005 6,841,032'Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamber'2005 6,830,649'Apparatus and method for producing semiconductors'2004 6,828,165'Semiconductor plasma processing apparatus with first and second processing state monitoring units'2004 6,825,617'Semiconductor processing apparatus'2004 6,796,269'Apparatus and method for monitoring plasma processing apparatus'2004 6,776,872'Data processing apparatus for semiconductor processing apparatus'2004 6,771,481'Plasma processing apparatus for processing semiconductor wafer using plasma'2004 6,755,932'Plasma processing system and apparatus and a sample processing method'2004 6,747,239'Plasma processing apparatus and method'2004 6,745,096'Maintenance method and system for plasma processing apparatus etching and apparatus'2004 6,733,618'Disturbance-free, recipe-controlled plasma processing system and method'2004 6,716,301'Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe'2004 6,706,543'Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor'2004 6,700,090'Plasma processing method and plasma processing apparatus'2004 6,653,594'Consumable electrode gas shielded arc welding method and apparatus'2003 6,618,692'Remote diagnostic system and method for semiconductor manufacturing equipment'2003 6,590,179'Plasma processing apparatus and method'2003 6,558,100'Vacuum processing apparatus and a vacuum processing system'2003 6,537,012'Vacuum processing apparatus and a vacuum processing system'2003 6,297,473'Arc welding method'2001 6,030,301'Sports posts'2000 5,932,381'Electrophotographic lithographic printing plate'1999 D0401162'Watch case with a protection device'1998 D0394610'Watch case'1998 D0394404'Wrist watch'1998 D0390800'Watch band'1998 D0387678'Watch case with a protection device'1997 D0387292'Wrist watch'1997 D0386975'Watch case'1997 D0378740'Wrist watch'1997 D0370858'Wrist watch'1996 5,460,912'Electrophotography type lithographic form plate for laser beam'1995 D0359000'Wrist watch with wireless remote controller for electronic instruments'1995 D0358997'Wrist watch with wireless remote controller for electronic instruments'1995 5,404,819'Apparatus for cleaning printing press blanket cylinder and method for manufacturing the same'1995 D0349248'Wrist watch'1994 D0339302'Wrist watch'1993 5,130,514'Control apparatus for tracing a weld line in a welding apparatus and control method therefor'1992 D0327442'Wrist watch'1992 D0327441'Wrist watch'1992 D0325535'Wrist watch'1992 4,990,743'Control method for tracing a weld line in a welding apparatus'1991 4,409,465'Pulse arc welding method and device in which pulse current and background current have a constant current characteristic'1983 4,125,759'Method and apparatus for shortcircuiting arc welding'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1992Based in Kobe, JP· patent location history

1991–2003Patents assigned to DAIHEN CORP (3)· patent assignee history

1992–1998Patents assigned to CASIO COMPUTER CO LTD (16)· patent assignee history

1992–1997Based in Fussa, JP· patent location history

1993–2016Based in Tokyo, JP· patent location history

1997–1998Based in Kosai, JP· patent location history

2003–2016Patents assigned to HITACHI LTD (33)· patent assignee history

2003–2010Based in Kudamatsu, JP· patent location history

2004–2009Patents assigned to HITACHI HIGH TECH CORP (22)· patent assignee history

2012–2015Patents assigned to YAMAMOTO HIDEYUKI (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	33	2003–2016
HITACHI HIGH TECH CORP	22	2004–2009
CASIO COMPUTER CO LTD	16	1992–1998
YAMAMOTO HIDEYUKIself	4	2012–2015
DAIHEN CORP	3	1991–2003

Locations

Location	Patents	Span
Kudamatsu, JP	54	2003–2010
Fussa, JP	8	1992–1997
Kosai, JP	7	1997–1998
Tokyo, JP	6	1993–2016
Kobe, JP	4	1978–1992