Inventor
Michael A. Graf
Inventor
Belmont, MA, US
Overview
Patents· 35 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps51%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
A61FFilters implantable into blood vessels7%
A61NElectrotherapy7%
C23CCoating metallic material7%
H01LSemiconductor devices3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
H05HPlasma technique2%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation2%
PatentTitleYear
10,861,674Compensated location specific processing apparatus and method202010,497,540Compensated location specific processing apparatus and method20199,735,019'Process gas enhancement for beam treatment of a substrate'20179,260,615'Adhesion-promoting additive for an ink for imprinting glass'20169,103,031'Method and system for growing a thin film using a gas cluster ion beam'20158,981,322'Multiple nozzle gas cluster ion beam system'20158,803,110'Methods for beam current modulation by ion source parameter modulation'20148,691,700'Gas cluster ion beam etch profile control using beam divergence'20148,338,806'Gas cluster ion beam system with rapid gas switching apparatus'20128,304,033'Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles'20128,193,513'Hybrid ion source/multimode ion source'20128,173,980'Gas cluster ion beam system with cleaning apparatus'20128,097,860'Multiple nozzle gas cluster ion beam processing system and method of operating'20128,089,052'Ion source with adjustable aperture'20127,750,320'System and method for two-dimensional beam scan across a workpiece of an ion implanter'20107,701,230'Method and system for ion beam profiling'20107,598,495'Methods and systems for trapping ion beam particles and focusing an ion beam'20097,589,333'Methods for rapidly switching off an ion beam'20097,557,363'Closed loop dose control for ion implantation'20097,423,277'Ion beam monitoring in an ion implanter using an imaging device'20087,375,355'Ribbon beam ion implanter cluster tool'20087,358,508'Ion implanter with contaminant collecting surface'20086,992,308'Modulating ion beam current'20066,992,310'Scanning systems and methods for providing ions from an ion beam to a workpiece'20066,953,942'Ion beam utilization during scanned ion implantation'20056,847,847'Retina implant assembly and methods for manufacturing the same'20056,828,572'Ion beam incident angle detector for ion implant systems'20046,804,560'Retina implant'20046,608,315'Mechanism for prevention of neutron radiation in ion implanter beamline'20036,534,775'Electrostatic trap for particles entrained in an ion beam'20036,476,399'System and method for removing contaminant particles relative to an ion beam'20026,347,250'Optically controllable microelectrode array for stimulating cells within a tissue'20026,298,270'Retina implant'20016,135,128'Method for in-process cleaning of an ion source'20006,101,971'Ion implantation control using charge collection, optical emission spectroscopy and mass analysis'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2014Patents assigned to AXCELIS TECH INC (18)· patent assignee history
2000–2006Based in Cambridge, MA, US· patent location history
2001–2005Patents assigned to EBERHARD KARLS UNI TUBINGEN UN (3)· patent assignee history
2001–2002Based in Waiblingen, DE· patent location history
2004–2005Based in Leonberg, DE· patent location history
2005–2020Based in Belmont, MA, US· patent location history
2012–2020Patents assigned to TEL EPION INC (10)· patent assignee history
2012–2016Patents assigned to GRAF MICHAEL (9)· patent assignee history
2012–2015Patents assigned to BECKER ROBERT K (4)· patent assignee history
2016Based in Bruck an der Mur, AT· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AXCELIS TECH INC | 18 | 2000–2014 |
| TEL EPION INC | 10 | 2012–2020 |
| GRAF MICHAELself | 9 | 2012–2016 |
| BECKER ROBERT K | 4 | 2012–2015 |
| EBERHARD KARLS UNI TUBINGEN UN | 3 | 2001–2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Belmont, Massachusetts, US | 23 | 2005–2020 |
| Cambridge, Massachusetts, US | 7 | 2000–2006 |
| Leonberg, DE | 2 | 2004–2005 |
| Waiblingen, DE | 2 | 2001–2002 |
| Bruck an der Mur, AT | 1 | 2016 |