Inventor

Mandeep Singh

Inventor
Kitchener, CA

Overview

43→
Patents
2002–2020
Patent span
Physics
Primary field (CPC G)

Patents· 43 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G06Fprimary
G06FElectric digital data processing15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
G02BOptical elements, systems or apparatus9%
G21KHandling of particles or ionising radiation not otherwise provided for9%
B82YSpecific uses or applications of nanostructures8%
Y10TTechnical subjects covered by former us classification8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
H04LTransmission of digital information, e.g. telegraphic communication4%
E05BLocks3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
10,835,101Draining system for wet objects on single and multi level trays202010,783,180Tool for mining chat sessions202010,740,126Methods, systems and apparatus for supporting wide and efficient front-end operation with guest-architecture emulation202010,713,047Fast unaligned memory access202010,467,010Method and apparatus for nearest potential store tagging201910,416,958Hierarchical clustering201910,360,031Fast unaligned memory access201910,289,419Method and apparatus for sorting elements in hardware structures201910,250,706Hierarchical Clustering201910,140,138Methods, systems and apparatus for supporting wide and efficient front-end operation with guest-architecture emulation201810,140,165Shell action browser extensions201810,072,441Strike assembly201810,072,440Electric strike assembly201810,025,573Extensible distribution/update architecture20189,891,654'Secure clock switch circuit'20189,756,681'System and method for providing IP version interworking for IMS access through EPC'20179,753,734'Method and apparatus for sorting elements in hardware structures'20179,580,935'Electric strike assembly'20179,471,469'Software automation and regression management systems and methods'20169,436,476'Method and apparatus for sorting elements in hardware structures'20169,217,923'Method of using an EUV mask during EUV photolithography processes'20159,075,316'EUV mask for use during EUV photolithography processes'20158,971,998'Systems and methods for multispectral scanning and detection for medical diagnosis'20158,812,084'Systems and methods for multispectral scanning and detection for medical diagnosis'20148,503,210'Conditionally precharged dynamic content addressable memory'20138,332,699'Scan insertion optimization using physical information'2012RE042338'Capping layer for EUV optical elements'20117,875,863'Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method'20117,628,865'Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus'20097,473,916'Apparatus and method for detecting contamination within a lithographic apparatus'20097,473,917'Lithographic apparatus and method'2009D0567621'Precision screw driver'2008D0559070'Precision screw driver'20087,289,693'System and method for producing optical circuits'2007D0551456'Wrench set case'20077,178,432'Methods, devices and systems for screw feeding by vacuum and gravity'20077,146,064'System and method for producing optical circuits'2006D0528797'Wrench set case'20066,985,211'Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask'20066,777,140'Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask'20046,738,188'Multilayer extreme ultraviolet mirrors with enhanced reflectivity'20046,724,462'Capping layer for EUV optical elements'20046,449,086'Multilayer extreme ultraviolet mirrors with enhanced reflectivity'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2011Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2002–2011Based in Twickenham, GB· patent location history
2006–2020Based in Kitchener, CA· patent location history
2009–2015Based in Delft, NL· patent location history
2012–2020Patents assigned to SINGH MANDEEP (8)· patent assignee history
2017–2020Patents assigned to INTEL CORP (7)· patent assignee history
2017–2020Based in Union City, CA, US· patent location history
2018Patents assigned to DORMAKABA CANADA INC (2)· patent assignee history
2019–2020Patents assigned to BANK OF AMERICA (3)· patent assignee history
2019–2020Based in Medford, MA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102002–2011
SINGH MANDEEPself82012–2020
INTEL CORP72017–2020
BANK OF AMERICA32019–2020
DORMAKABA CANADA INC22018
Locations
LocationPatentsSpan
Kitchener, CA72006–2020
Union City, California, US72017–2020
Delft, NL62009–2015
Twickenham, GB62002–2011
Medford, Massachusetts, US32019–2020