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Inventor

Taihei INOUE

Inventor
JP

Overview

3→
Patents
2021–2025
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds18%
C08LCompositions of macromolecular compounds18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients9%
H01LSemiconductor devices9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
LOC159%
PatentTitleYear
D1107347Washing machine202511,809,079Photosensitive resin composition, polyimide production method, and semiconductor device202311,163,234Photosensitive resin composition and method for producing cured relief pattern2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2023Patents assigned to ASAHI CHEMICAL IND (2)· patent assignee history
2021–2025Based in JP· patent location history
2025Patents assigned to IRIS OHYAMA INC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASAHI CHEMICAL IND22021–2023
IRIS OHYAMA INC12025
Locations
LocationPatentsSpan
JP32021–2025