Inventor
Chad Peterson
Inventor
San Jose, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1038%
C23CCoating metallic material13%
PatentTitleYear
7,951,730'Decreasing the etch rate of silicon nitride by carbon addition'20117,851,384'Method to mitigate impact of UV and E-beam exposure on semiconductor device film properties by use of a bilayer film'20107,501,355'Decreasing the etch rate of silicon nitride by carbon addition'20096,667,248'Low-bias-deposited high-density-plasma chemical-vapor-deposition silicate glass layers'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2011Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2003–2011Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 4 | 2003–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 4 | 2003–2011 |