Inventor

Masayoshi Furukawa

Inventor

Osaka, JP

Overview

1998–2018

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Mprimary

B41MPrinting, duplicating, marking, or copying processes20%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%

B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form10%

B41CProcesses for the manufacture or reproduction of printing surfaces10%

B41NPrinting plates or foils10%

G02BOptical elements, systems or apparatus10%

G03CPhotosensitive materials for photographic purposes10%

Y10TTechnical subjects covered by former us classification10%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1998–2002Patents assigned to DAICEL CHEM (2)· patent assignee history

1998Based in Himeji, JP· patent location history

2002Based in Amagasaki, JP· patent location history

2018Patents assigned to BASF SE (1)· patent assignee history

2018Patents assigned to CENTRAL GLASS CO LTD (1)· patent assignee history

2018Patents assigned to NIPPON KAYAKU KK (1)· patent assignee history

2018Based in Osaka, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations