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Inventor

STEVEN ERIK STEEN

Inventor
NL

Overview

2→
Patents
2022–2023
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
11,768,441Method for controlling a manufacturing process and associated apparatuses202311,385,554Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2023Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2022–2023Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22022–2023
Locations
LocationPatentsSpan
NL22022–2023