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Inventor

Hatsuo Nakamura

Inventor
Yokohama, JP

Overview

4→
Patents
1984–1994
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests22%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients11%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
5,305,222'Pattern forming system'19944,610,079'Method of dicing a semiconductor wafer'19864,525,523'Negative-working photoresist coating composition'19854,461,825'Method for forming resist pattern'1984

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1984–1986Patents assigned to TOKYO SHIBAURA ELECTRIC CO (3)· patent assignee history
1984–1994Based in Yokohama, JP· patent location history
1985Patents assigned to KANTO KAGAKU (1)· patent assignee history
1994Patents assigned to TOSHIBA KK (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO SHIBAURA ELECTRIC CO31984–1986
KANTO KAGAKU11985
TOSHIBA KK11994
Locations
LocationPatentsSpan
Yokohama, JP41984–1994