Inventor
Keisuke Nakayama
Inventor
Tokyo, JP
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
G11BInformation storage based on relative movement between record carrier and transducer5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations4%
C07DHeterocyclic compounds4%
G06FElectric digital data processing4%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes4%
G07FCoin-freed or like apparatus4%
PatentTitleYear
10,796,994Semiconductor device and IO-cell202010,553,967Electronic device having fixed conductive plates and elastic conductive plates202010,251,295Electronic device and method of producing the same201910,121,747Semiconductor device and IO-cell20189,859,512'Substrate having rugged structure obtained from hydrophobic sol/gel material'20189,612,139'Position detecting device'20178,802,971'Photoelectric conversion element'20148,025,512'Object fitting/removing drive unit, and connector unit'20117,947,424'Composition for forming anti-reflective coat'20117,846,638'Composition for forming anti-reflective coating for use in lithography'20107,795,369'Sulfur atom-containing anti-reflective coating forming composition for lithography'20107,687,431'Nanotube-shaped titania and process for producing the same'20107,596,768'Screensaver display method and information processing system'2009D0588593'Computer'20097,501,229'Anti-reflective coating containing sulfur atom'2009D0587259'Computer'20097,425,399'Composition for forming anti-reflective coating for use in lithography'20087,266,695'Data updating method and data updating system'2007D0540320'Computer'20077,174,321'Memory rental service system in intelligent authentication unit'20077,038,328'Anti-reflective compositions comprising triazine compounds'20066,938,020'Memory rental service system in intelligent authentication unit'20056,458,870'Process for preparing an aqueous solution of sulfanilic acid modified melamine-formaldehyde resin and a cement composition'20026,256,280'Disk ejection device'20016,214,965'Process for preparing an aqueous solution of sulfanilic acid modified melamine-formaldehyde resin and a cement composition'20016,198,713'Power transmitting mechanism for disk apparatus'20016,188,663'Recording medium loading device'20016,188,664'Pivotable restraining means for a disk operating apparatus'20015,998,573'Amino resin composition'19995,687,383'Translation rule learning scheme for machine translation'19975,041,440'Dithiolane derivatives'19914,863,925'Cyclohexanedione derivative for hepatic disorders and a process for producing the same'19894,835,153'Malonic acid derivatives'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1991Patents assigned to NIHON NOHYAKU CO LTD (3)· patent assignee history
1999–2011Patents assigned to NISSAN CHEMICAL IND LTD (8)· patent assignee history
2001–2017Patents assigned to ALPS ELECTRIC CO LTD (5)· patent assignee history
2001–2020Based in Miyagi, JP· patent location history
2001–2011Based in Nishikamo-gun, JP· patent location history
2005–2009Patents assigned to SYSTEMNEEDS INC (4)· patent assignee history
2005–2020Based in Tokyo, JP· patent location history
2007–2018Based in Yokohama, JP· patent location history
2009–2011Patents assigned to NEC CORP (3)· patent assignee history
2009–2011Based in Yamanashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL IND LTD | 8 | 1999–2011 |
| ALPS ELECTRIC CO LTD | 5 | 2001–2017 |
| SYSTEMNEEDS INC | 4 | 2005–2009 |
| NEC CORP | 3 | 2009–2011 |
| NIHON NOHYAKU CO LTD | 3 | 1989–1991 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 6 | 2005–2020 |
| Miyagi, JP | 6 | 2001–2020 |
| Nishikamo-gun, JP | 5 | 2001–2011 |
| Yokohama, JP | 3 | 2007–2018 |
| Yamanashi, JP | 3 | 2009–2011 |