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Inventor

Tetsuji Sato

Inventor
Nirasaki, JP

Overview

22→
Patents
1990–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
Y10TTechnical subjects covered by former us classification8%
F04DNon-positive-displacement pumps6%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants6%
B64CAeroplanes4%
C23CCoating metallic material4%
F15BSystems acting by means of fluids in general4%
H04LTransmission of digital information, e.g. telegraphic communication4%
LOC194%
PatentTitleYear
10,959,237Base station apparatus and communication control method202110,847,348Plasma processing apparatus and plasma processing method20209,455,125'Substrate processing apparatus'2016D0709536'Focusing ring'20148,727,708'Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component'20148,687,343'Substrate mounting table of substrate processing apparatus'20148,524,005'Heat-transfer structure and substrate processing apparatus'20138,173,036'Plasma processing method and apparatus'20128,083,891'Plasma processing apparatus and the upper electrode unit'20118,077,761'Data transmission and reception module, and method of adjusting reception threshold value thereof'20117,927,066'Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component'20117,837,432'Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus'20107,815,767'Plasma processing apparatus'20107,707,924'Linear actuator'20107,513,112'Reservoir built-in type actuator'20097,438,783'Plasma processing apparatus and plasma processing method'20087,382,987'Identification level control method and optical receiver'2008D0495008'India ink container'2004D0493489'India ink container'20045,808,571'Synchronization control unit which maintains synchronization between serial-to-parallel converters operating in parallel, or between parallel-to-serial converters operating in parallel'19985,767,396'Method and device for measuring fuel injection timing'19984,914,425'Highly sensitive smoke detector'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2011Patents assigned to FUJITSU LTD (3)· patent assignee history
1998–2008Based in Yokohama, JP· patent location history
2008–2020Patents assigned to TOKYO ELECTRON LTD (12)· patent assignee history
2008–2016Based in Yamanashi, JP· patent location history
2009–2010Based in Hyogo, JP· patent location history
2010–2014Based in Nirasaki, JP· patent location history
2011–2016Patents assigned to SATO TETSUJI (8)· patent assignee history
2013–2014Patents assigned to MIYAGAWA MASAAKI (2)· patent assignee history
2014–2016Patents assigned to YOSHIMURA AKIHIRO (3)· patent assignee history
2014–2020Based in Miyagi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD122008–2020
SATO TETSUJIself82011–2016
FUJITSU LTD31998–2011
YOSHIMURA AKIHIRO32014–2016
MIYAGAWA MASAAKI22013–2014
Locations
LocationPatentsSpan
Nirasaki, JP72010–2014
Yamanashi, JP32008–2016
Miyagi, JP22014–2020
Hyogo, JP22009–2010
Yokohama, JP21998–2008