Inventor
Peter A. Emmi
Inventor
Hyde Park, NY, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1042%
H10DInorganic electric semiconductor devices25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
C23CCoating metallic material8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
6,758,223'Plasma RIE polymer removal'20046,488,778'Apparatus and method for controlling wafer environment between thermal clean and thermal processing'20026,387,754'Method of forming an on-chip decoupling capacitor with bottom hardmask'20026,278,147'On-chip decoupling capacitor with bottom hardmask'20016,268,621'Vertical channel field effect transistor'20016,178,660'Pass-through semiconductor wafer processing tool and process for gas treating a moving semiconductor wafer'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2002Patents assigned to IBM (5)· patent assignee history
2001–2002Based in Hyde Park, NY, US· patent location history
2002Patents assigned to INFINEON TECHNOLOGIES CORP (1)· patent assignee history
2002Based in Cliffton Park, NY, US· patent location history
2004Patents assigned to INFINEON TECHNOLOGIES AG (1)· patent assignee history
2004Based in White Plains, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 5 | 2001–2002 |
| INFINEON TECHNOLOGIES AG | 1 | 2004 |
| INFINEON TECHNOLOGIES CORP | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hyde Park, New York, US | 4 | 2001–2002 |
| White Plains, New York, US | 1 | 2004 |
| Cliffton Park, New York, US | 1 | 2002 |